The zircondri filin wtut rirconia wa prepared and the removing technology of the zirconia on the zirconium sdrices was obtalned . the methods of chemistry and magnetron sputtring plating were used in order to platc a palladium film , which is characteristic of self catalysis for hydrogen and the sole h - permselectivity on the clean rirconium sdrices prepared by the methods of electrochemitw and ( or ) high temperatur vacuum hydrgenization , which was firstly studied . the plating tedrilogy was obained and the surface modified zirconium membran was prepared
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